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Plasma-Enhanced Atomic Layer Deposition of Al<inf>2</inf>O<inf>3</inf> on Graphene Using Monolayer hBN as Interfacial Layer
B Canto, M Otto, MJ Powell, V Babenko, A O'Mahony, HCM Knoops, RS Sundaram, S Hofmann, MC Lemme, D Neumaier
Jul 28, 2021
Abstract: The deposition of dielectric materials on graphene is one of the bottlenecks for unlocking the potential of graphene in electronic applications. The plasma enhanced atomic layer deposition of 10 nm thin high quality...