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Cover Image for Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography View Article
Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography
C Williams, R Bartholomew, G Rughoobur, GSD Gordon, AJ Flewitt, TD Wilkinson
Dec 20, 2016
nanofabrication electron beam lithography UV1116 insulating substrate plasmonics transmissive optical devices
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