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An RF Approach to Modelling Gallium Nitride Power Devices Using Parasitic Extraction
This paper begins with a comprehensive review into the existing GaN device models. Secondly, it identifies the need for a more accurate GaN switching model. A simple practical process based on radio frequency techniques...
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Sequential plan-view imaging of sub-surface structures in the transmission electron microscope
Transmission electron microscopy (TEM) is a central technique for the characterisation of materials at the atomic scale. However, it requires the sample to be thin enough to be electron transparent, imposing strict limitations...
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Oxidation of GaN
Adam Jackson, A Walsh
Jan 01, 0001

GaN is a wide-band-gap semiconductor used in high-efficiency light-emitting diodes and solar cells. The solid is produced industrially at high chemical purities by deposition from a vapor phase, and oxygen may be included at...

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Combined SEM-CL and STEM investigation of green InGaN quantum wells
Abstract: The microstructure of green-emitting InGaN/GaN quantum well (QW) samples grown at different temperatures was studied using cross-section scanning transmission electron microscopy (STEM) and plan-view...
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Combined SEM-CL and STEM investigation of green InGaN quantum wells
Abstract: The microstructure of green-emitting InGaN/GaN quantum well (QW) samples grown at different temperatures was studied using cross-section scanning transmission electron microscopy (STEM) and plan-view...
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Combined SEM-CL and STEM investigation of green InGaN quantum wells
Abstract The microstructure of green-emitting InGaN/GaN quantum well (QW) samples grown at different temperatures was studied using cross-section scanning transmission electron...
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Oxidation of GaN
Adam Jackson, A Walsh
Jan 01, 0001

GaN is a wide-band-gap semiconductor used in high-efficiency light-emitting diodes and solar cells. The solid is produced industrially at high chemical purities by deposition from a vapor phase, and oxygen may be included at...

Published by:
Young's modulus, Poisson's ratio, and residual stress and strain in (111)-oriented scandium nitride thin films on silicon
Epitaxial scandium nitride films (225 nm thick) were grown on silicon by molecular beam epitaxy, using ammonia as a reactive nitrogen source. The main crystallographic orientation of ScN with respect to Si is (111)(ScN)parallel...
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