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Effects of post-deposition vacuum annealing on film characteristics of p-type Cu$_{2}$O and its impact on thin film transistor characteristics

S Han, KM Niang, G Rughoobur, AJ Flewitt

OAI: oai:www.repository.cam.ac.uk:1810/261630 • DOI: 10.17863/CAM.6841

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Abstract

Copper thin film transistors Metallic thin films contact resistance sputter deposition